131345Feasibility of using ion implantation to improve the efficiency and beam quality of micro-pixelated linear arrays for maskless lithographyClosedFeasibility StudiesInnovate UKThis project considers the feasibility of applying the established technique of ion-implantation of semiconductors in a novel way - to improve the performance of a microLED array. The array performance will be improved in both the spatial quality of light emitted and the wall-plug efficiency. A successful outcome will allow mLED to target new customer applications and access part of a $6billion market.