133250“n-CANTER”: Non-Chemically Amplified Negative Tone Ebeam ResistClosedFeasibility StudiesInnovate UK"Semiconductors are ubiquitous in many industrial and everyday consumer products e.g. smartphones and LED bulbs, along with solar panels, energy and space applications. Electron beam lithography, a key process in semiconductor manufacture, is used by universities and research centres and in high end industrial processes to create nanoscale patterns for use in nanoelectronic applications and microprocessor design and manufacture. Despite progress made over the last 50 years in electron beam optimisation, which facilitates the creation of two-dimensional nanoscale patterns at high resolution, density and reliability, resist materials are reaching their resolution limit. New high performance resist material technology is needed to meet the requirements of new technology nodes and to support future technological progress. EM Resist Limited will undertake a Feasibility Study and Industrial Research Project for the development of a novel resist material that addresses the current limits to resolution and throughput presented by existing resist materials, and meets the urgent industry and research community need for a less expensive, more stable and easier-to-use technology that facilitates further R&D."