710156Next Generation Photoresist Technology for MicrochipsClosedGRD Proof of ConceptInnovate UKIrresistible Materials (IM) is developing next generation ‘photo-resist materials’ for the semiconductor industry. A photo-resist is a material that undergoes a change in its physical and/or chemical properties when exposed to radiation. Within the semiconductor industry, silicon substrates are coated by a photo-resist, and the resist is then selectively exposed to radiation using an ‘exposure tool’ to create a pattern (photo-lithography). The resist is then treated such that either the exposed or unexposed areas are dissolved. The remaining resist patterns serve as a barrier that protects the underlying substrate, and once the substrate is processed, the resist layer is stripped leaving lines (wires) used as the basis for today’s microchips. Resists are thus critical to the semiconductor industry, and the ever decreasing size of microelectronics is possible only through continuous advancements in lithography and resist technologies. The progression to decreased size is mapped out in the International Technology Roadmap for Semiconductors (ITRS), revised annually by a worldwide panel of semiconductor experts, which sets out performance goals for the industry. Existing photolithography (where the radiation used is 193nm wavelength light) is reaching its limit, and is unlikely to meet industry goals for 2016. Accordingly, next-generation lithographies (NGL’s) are being sought to take over in 2016. The leading candidate of NGL’s is extreme ultraviolet lithography (EUV), where the wavelength of the radiation (light source) is reduced to 13.5nm enabling higher resolution patterns, and thus smaller micro-chip wires. However, presently there are two major problems with EUV lithography: 1. EUV exposure tools are very expensive: $billions are being invested into new EUV equipment to address this. 2. There is no EUV compatible resist material that meets the 2016 targets: Irresistible Materials Ltd has developed a patented material that directly addresses this issue.