<?xml version="1.0" encoding="UTF-8"?><ns2:project xmlns:ns1="http://gtr.rcuk.ac.uk/gtr/api" xmlns:ns2="http://gtr.rcuk.ac.uk/gtr/api/project" xmlns:ns3="http://gtr.rcuk.ac.uk/gtr/api/fund" xmlns:ns4="http://gtr.rcuk.ac.uk/gtr/api/person" xmlns:ns5="http://gtr.rcuk.ac.uk/gtr/api/project/outcome" xmlns:ns6="http://gtr.rcuk.ac.uk/gtr/api/organisation" ns1:created="2026-06-03T15:52:43Z" ns1:href="http://gtr.ukri.org/gtr/api/projects/7F165D7F-C437-495C-A6FC-D582DECEDE29" ns1:id="7F165D7F-C437-495C-A6FC-D582DECEDE29"><ns1:links><ns1:link ns1:href="http://gtr.ukri.org/gtr/api/persons/744373A4-BD0F-4C65-928C-9302E1E06037" ns1:rel="PM_PER"/><ns1:link ns1:href="http://gtr.ukri.org/gtr/api/organisations/81BE5D19-B348-42FD-AE86-9C07E75E45BB" ns1:rel="LEAD_ORG"/><ns1:link ns1:href="http://gtr.ukri.org/gtr/api/organisations/81BE5D19-B348-42FD-AE86-9C07E75E45BB" ns1:rel="PARTICIPANT_ORG"/><ns1:link ns1:end="2021-12-31T00:00:00Z" ns1:href="http://gtr.ukri.org/gtr/api/funds/6C50B5AB-8F2F-43C9-B85E-99FEC91DAC05" ns1:rel="FUND" ns1:start="2020-09-30T23:00:00Z"/></ns1:links><ns2:identifiers><ns2:identifier ns2:type="RCUK">106359</ns2:identifier></ns2:identifiers><ns2:title>Development of Silicon Nitride AFM Probes</ns2:title><ns2:status>Closed</ns2:status><ns2:grantCategory>Collaborative R&amp;D</ns2:grantCategory><ns2:leadFunder>Innovate UK</ns2:leadFunder><ns2:abstractText>Atomic force microscopy (AFM), is a versatile metrology technique capable of imaging surfaces on the nanometre scale, has widespread use in the semiconductor industry, academic research institutions and, increasingly, in life sciences and biomedical sectors. The critical part of an atomic force microscope is a microfabricated silicon sensor (the probe), akin to a record player cantilever and stylus. These probes are consumables requiring regular replacement as they wear out during use.

This project aims to develop NuNano's first Silicon Nitride (SiN) AFM probes, to enable us to significantly expand our addressable market. To create softer, more sensitive AFM probes, only a very thin layer (e.g. 500nm) of silicon nitride is required, making the probes very fragile. Significant design and process hurdles need to be overcome in order to fabricate silicon nitride probes reliably and bring them to market.</ns2:abstractText></ns2:project>