10105959Quantification of the errors caused by multi-directional of scanning techniques on high accuracy nanopositioning stagesClosedCollaborative R&DInnovate UKAdvanced scanning patterns have advantages for techniques such as AFM as they increase the scanning speed and enable movement without abrupt changes in velocity, however high precision positioning during the scanning is also required. Other applications such as nanolithography, semiconductor testing and photonics use advanced scanning patterns and require precision positioning. A stage that can operate at highspeed with precision has the potential to deliver higher throughput and reduce costs providing a significant commercial advantage. The objective of this project is to characterise the performance of Queensgate nanopositioning XY stages for advanced scanning patterns. The company have developed a number of unique capabilities such as velocity control and spatial correction which allow very highspeed raster scanning with high precision. Typically four or five times faster than our competitors while maintaining nanometre precision. Firmware will be developed to generate advanced scanning patterns from a matrix of coordinates. Error data collected will be used to modify our firmware to ensure smooth transition from coordinate to coordinate along the prescribed trajectory. This will provide sophisticated scanning routines or feed patterns for many applications with minimal user programming. Similarly, the performance of the highspeed interface will be error tested, this is necessary for industrial applications requiring real time generation of advanced patterns. In this project we will combine advanced scanning patterns with velocity control and highspeed digital interfacing to provide a low cost, low noise solution for highspeed scanning profiles.