📣 Try out the NEW Gateway to Research and let us know what you think.

We're looking for users to test the new service during August and September and share their feedback. Express your interest by completing this short form.

A high resolution water soluble fullerene molecular resist for electron beam lithography. (2008)

First Author: Chen X

Attributed to: Materials Program Platform Grant: Nanostructured Surfaces funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1088/0957-4484/19/27/275308

PubMed Identifier: 21828704

Publication URI: http://europepmc.org/abstract/MED/21828704

Type: Journal Article/Review

Volume: 19

Parent Publication: Nanotechnology

Issue: 27

ISSN: 0957-4484