A high resolution water soluble fullerene molecular resist for electron beam lithography (2008)
Attributed to:
Materials Program Platform Grant: Nanostructured Surfaces
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1088/0957-4484/19/27/275308
PubMed Identifier: 21828704
Publication URI: http://europepmc.org/abstract/MED/21828704
Type: Journal Article/Review
Parent Publication: Nanotechnology
Issue: 27
ISSN: 0957-4484