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Contact resistance of various metallisation schemes to superconducting boron doped diamond between 1.9 and 300 K (2021)

First Author: Manifold S

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.carbon.2021.02.079

Publication URI: http://dx.doi.org/10.1016/j.carbon.2021.02.079

Type: Journal Article/Review

Parent Publication: Carbon