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High-k (k=30) amorphous hafnium oxide films from high rate room temperature deposition (2011)

First Author: Li F

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.3601487

Publication URI: http://dx.doi.org/10.1063/1.3601487

Type: Journal Article/Review

Parent Publication: Applied Physics Letters

Issue: 25