Sub-Micron 3D Holographic Lithography.

Lead Research Organisation: Durham University
Department Name: Engineering and Computing Sciences

Abstract

The miniaturization of measurement systems has been an outstanding technological success for many decades enabling some of mankind's most spectacular achievements. For example: extra terrestrial space landings on the large scale and in-vivo intensive care instrumentation on a small scale. In-situ measurement is fundamental to progress and will remain so for the discoveries to come. Connecting together and assembling these micro- and nano- systems has been achieved to date with essentially planar solutions. Photographically defined wires on flat silicon chips have suited the mass manufacture market well and avoided time consuming writing in three dimensions of one wire at a time. Our research programme addresses this problem, to enable the creation of three dimensional measuring devices on the nanometric scale produced as we manufacture computer chips at present. When component size gets very small, the molecular world is rarely flat and our project in Holographic Lithography is intended to pioneer some of the approaches needed to engineer and build this new small world. The construction of the silicon age has required as many sophisticated tools as the building of previous stone, steam or space ages . One technique above all others stands out as we live through the information revolution: that of lithography. Akin to photography, the creation of micro circuits by developing overlaid pictures of the components and interconnections required has reached incredible precision. But like all photographs, photocopiers or printers, they freeze the action on a two dimensional plane. Attempts to move into the three-dimensional, sub-micron world leave us with out of focus and coarse structures requiring individual attention and wire-by-wire assembly. However, holograms give us the means to store and reproduce three-dimensional images as they ought to be. We can use holograms as a pair of spectacles in our lithography system to enable us to create the correct patterns in three-dimensions.Our research is aimed at extending two-dimensional photolithography, which has already achieved deep sub micron resolutions of better than 50 nanometres, to three-dimensional holographic lithography. The potential applications occur wherever the small active measurement system has to connect to the real world. Miniature gyroscpes or microphones, aerials and test tubes are all 3D real objects able to work more effectively if not constrained to flat world restrictions. In terms of connection alone, the ability to wire and stack existing 2D computer chips with a 3D wire lattice between layers will enable a greater information processing density for new computer technology.Potential benefits can now be extrapolated. An age comes to an end for the researchers when every last ounce of performance is squeezed from the technology. Expanding information processing into the third dimension is an inevitable but tricky step to accomplish. We believe our work in sub-micron Holographic Lithography will enable one of the required tools and will thus bring many direct and indirect benefits both to the scientific and wider community.
 
Description Developed the ability to write 3D structures at micron scale.
Exploitation Route For creation of 3D ICs,
Sectors Electronics

URL https://www.dur.ac.uk/ces/projects/3di/
 
Description interaction with artist using holography
Sector Creative Economy,Electronics
Impact Types Cultural

 
Description Impact Acceleration Award
Amount £7,000 (GBP)
Organisation Engineering and Physical Sciences Research Council (EPSRC) 
Sector Public
Country United Kingdom
Start 04/2014 
End 09/2014
 
Description School of Engineering Studentship (Joshua Cowling)
Amount £60,000 (GBP)
Organisation Durham University 
Sector Academic/University
Country United Kingdom
Start 09/2009 
End 09/2012
 
Description epsrc Studentship
Amount £60,000 (GBP)
Organisation Engineering and Physical Sciences Research Council (EPSRC) 
Sector Public
Country United Kingdom
Start 01/2010 
End 01/2013
 
Description Collaborative publication with MolTech GmbH 
Organisation MolTech GmbH
Country Germany 
Sector Private 
PI Contribution Evaulation of beam shaping optics (using "piShaper" from MolTech GmbH) in our research apparatus. Resulted in conference papers that demonstrated improvements brought to quality of holographic lithography process.
Collaborator Contribution Loan of "piShaper" optics for initlal trials and delivery of conference papers.
Impact Primary outcomes were co-authored conference papers: 10.1117/12.841289 and 10.1117/12.858646. This collaboration was not multi-disciplinary.
Start Year 2010
 
Title EXPOSURE APPARATUS AND METHODS 
Description A light beam collimated by illumination optics from a radiation source illuminates the surface of a wave front modulator such as an Spatial Light Modulator (SLM) or Computer Generated Hologram photomask (CGH). The resulting wave travels via projection optics to the substrate, passing through a projection lens assembly. 
IP Reference EP2321702 
Protection Patent granted
Year Protection Granted 2011
Licensed No
Impact N/A
 
Title Holographic lithography using geometrical shapes 
Description A method and system for generating holographic diffraction patterns is disclosed. The method includes the steps of defining at least one geometrical shape; generating at least one line segment to represent the at least one geometrical shape; calculating a line diffraction pattern on a hologram plane, including calculating the Fresnel diffraction equation for an impulse representing the at least one line segment with a line width control term and a line length control term; and adding vectorially, where there are two or more line segments, the line diffraction patterns to form the holographic diffraction pattern. The method enables generation of two and three-dimensional shapes through the use of the line width and line length control terms and identifying where any lines cross so that the diffraction pattern can be suitably corrected. 
IP Reference GB2419501 
Protection Patent granted
Year Protection Granted 2006
Licensed No
Impact N/A
 
Title Improvements in or relating to holography 
Description An iterative algorithm for hologram design with multiple output image planes arranged in close proximity to create continuous patterns within an imaging volume is disclosed. These may then be used for photolithography on 3D surfaces, or for generation of holograms for use in consumer devices. 
IP Reference GB2490065 
Protection Patent application published
Year Protection Granted 2012
Licensed No
Impact N/A
 
Title 3D Maskless Lithographic Exposure Tool 
Description As outlined in the grant proposal, we have created a 3D maskless Lithographic exposure tool as a prototype from an existing maskless exposure tool. 
Type Of Technology New/Improved Technique/Technology 
Year Produced 2010 
Impact pending. 
 
Title Conical Spiral Antenna 
Description We have developed a process which has allowed us to produce a conical spiral antenna as a demonstration of holographic lithography for a real application. 
Type Of Technology Physical Model/Kit 
Year Produced 2010 
Impact demonstrator unit made 
 
Title Matlab based Iterative optimisation algorithm package developed in-house 
Description Matlab based Iterative optimisation algorithm package developed in-house 
Type Of Technology Software 
Year Produced 2010 
Impact led to patent application 
 
Description Exhibition and presentation at Photonex industry conference 
Form Of Engagement Activity A talk or presentation
Part Of Official Scheme? No
Geographic Reach National
Primary Audience Other academic audiences (collaborators, peers etc.)
Results and Impact The presentation was used as a vehicle for discussions with industrial specialists in optics community and exhibition to attract potential collaboration.

A number of industrial leads were pursued following the event.
Year(s) Of Engagement Activity 2010
 
Description IEEE Plenary Talk 
Form Of Engagement Activity A talk or presentation
Part Of Official Scheme? No
Geographic Reach International
Primary Audience Professional Practitioners
Results and Impact IEEE plenary talk at University of Peradeniya.

N/A
Year(s) Of Engagement Activity 2011
 
Description Impact Acceleration Visit to Silicon Valley, July 2014 
Form Of Engagement Activity Participation in an activity, workshop or similar
Part Of Official Scheme? Yes
Geographic Reach International
Primary Audience Professional Practitioners
Results and Impact Practical demonstration of new technology as a trade show stand.

Follow up discussions with companies about interest level.
Year(s) Of Engagement Activity 2014
 
Description Invited presentation to health professionals, Royal United Hospital, Bath 
Form Of Engagement Activity A talk or presentation
Part Of Official Scheme? No
Geographic Reach Local
Primary Audience Health professionals
Results and Impact Discussions with health professionals after presentation regarding novel sensors

No specific follow-up.
Year(s) Of Engagement Activity 2012
 
Description Membership of Through Life Engineering Services Advisory Board (Alan Purvis) 
Form Of Engagement Activity A formal working group, expert panel or dialogue
Part Of Official Scheme? Yes
Geographic Reach International
Primary Audience Professional Practitioners
Results and Impact Professor Alan Purvis assigned membership of Through Life Engineering Services: Innovative Manufacturing advisory board . Awarding Body - EPSRC, CIM

consultation on novel sensors, for example.
Year(s) Of Engagement Activity 2011
 
Description Presentation at IeMRC conference, Loughborough 
Form Of Engagement Activity A talk or presentation
Part Of Official Scheme? No
Geographic Reach National
Primary Audience Other academic audiences (collaborators, peers etc.)
Results and Impact Research presentation "3D photolithography" given to peers within the EPSRC IeMRC centre.

Primarily discussions with peers.
Year(s) Of Engagement Activity 2011
 
Description Presentation at research to industry (R2i) IMAPS community, Loughnborough 
Form Of Engagement Activity A talk or presentation
Part Of Official Scheme? Yes
Geographic Reach National
Primary Audience Other academic audiences (collaborators, peers etc.)
Results and Impact Elevator pitch "3d photolithography"

A number of queries following event about our research.
Year(s) Of Engagement Activity 2012
URL http://uk.imapseurope.org/index.php/event-calender/details/25-R2i
 
Description Presentation to Intel Ireland 2009 
Form Of Engagement Activity A talk or presentation
Part Of Official Scheme? No
Geographic Reach International
Primary Audience Professional Practitioners
Results and Impact Presentation to Intel Ireland 2009.

N/A
Year(s) Of Engagement Activity 2009
 
Description Presentation to Intel USA 2008 
Form Of Engagement Activity A talk or presentation
Part Of Official Scheme? No
Geographic Reach International
Primary Audience Professional Practitioners
Results and Impact Presentation to Intel USA 2008.

N/A
Year(s) Of Engagement Activity 2008
 
Description Presentations at Ben-Gurion University and Technion In Israel 
Form Of Engagement Activity A talk or presentation
Part Of Official Scheme? No
Geographic Reach International
Primary Audience Professional Practitioners
Results and Impact Presentations at Ben-Gurion University and Technion In Israel.

Follow on interaction with life sciences microscopy idea.
Year(s) Of Engagement Activity 2011
 
Description Presentations to ESME Grand Ecole Paris 2012 
Form Of Engagement Activity A talk or presentation
Part Of Official Scheme? No
Geographic Reach International
Primary Audience Public/other audiences
Results and Impact Presentations to ESME Grand Ecole Paris 2012.

One student was attracted to a Summer Placement in Durham to work with the team.
Year(s) Of Engagement Activity 2012