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CD uniformity improvement on the self-aligned spacer double-patterning process by resist material modification (2012)

First Author: Ohmori K

Attributed to: Cardiff PATT Rolling Grant funded by STFC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1117/12.916321

Publication URI: http://dx.doi.org/10.1117/12.916321

Type: Conference/Paper/Proceeding/Abstract