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Averaging the intensity of many-layered structures for accurate stacking-fault analysis using Rietveld refinement (2016)

First Author: Coelho A

Attributed to: New Oxychalcogenides for Electronic, Magnetic and Optical Applications funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1107/s1600576716013066

Publication URI: http://dx.doi.org/10.1107/s1600576716013066

Type: Journal Article/Review

Parent Publication: Journal of Applied Crystallography

Issue: 5

ISSN: 1600-5767