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Room temperature atomic layer deposited Al2O3 on CH3NH3PbI3 characterized by synchrotron-based X-ray photoelectron spectroscopy (2017)

First Author: Kot M

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.nimb.2017.01.082

Publication URI: http://dx.doi.org/10.1016/j.nimb.2017.01.082

Type: Journal Article/Review

Parent Publication: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

ISSN: 0168-583X