"Double" displacement Talbot lithography: fast, wafer-scale, direct-writing of complex periodic nanopatterns. (2019)
Attributed to:
Manufacturing of nano-engineered III-N semiconductors: Equipment Business Case
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1364/oe.27.032037
PubMed Identifier: 31684423
Publication URI: http://europepmc.org/abstract/MED/31684423
Type: Journal Article/Review
Volume: 27
Parent Publication: Optics express
Issue: 22
ISSN: 1094-4087