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"Double" displacement Talbot lithography: fast, wafer-scale, direct-writing of complex periodic nanopatterns. (2019)

First Author: Chausse P
Attributed to:  Manufacturing of nano-engineered III-N semiconductors: Equipment Business Case funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1364/oe.27.032037

PubMed Identifier: 31684423

Publication URI: http://europepmc.org/abstract/MED/31684423

Type: Journal Article/Review

Volume: 27

Parent Publication: Optics express

Issue: 22

ISSN: 1094-4087