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Complementary Metal-Oxide-Semiconductor Compatible Deposition of Nanoscale Transition-Metal Nitride Thin Films for Plasmonic Applications. (2020)

First Author: Bower R
Attributed to:  Advanced Functional Materials funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/acsami.0c10570

PubMed Identifier: 32960569

Publication URI: http://europepmc.org/abstract/MED/32960569

Type: Journal Article/Review

Volume: 12

Parent Publication: ACS applied materials & interfaces

Issue: 40

ISSN: 1944-8244