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Diamond chemical vapor deposition using a zero-total gas flow environment (2020)

First Author: Croot A

Attributed to: Metrology concepts for a new generation of plasma manufacturing with atom-scale precision funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.diamond.2020.108011

Publication URI: http://dx.doi.org/10.1016/j.diamond.2020.108011

Type: Journal Article/Review

Parent Publication: Diamond and Related Materials