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Effects of biased irradiation on charge trapping in HfO2 dielectric thin films (2017)

First Author: Mu Y

Attributed to: High permittivity dielectrics on Ge for end of Roadmap application funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.4999899

Publication URI: http://dx.doi.org/10.1063/1.4999899

Type: Conference/Paper/Proceeding/Abstract