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Spatial periodicities inside the Talbot effect: understanding, control and applications for lithography. (2021)

First Author: Chausse P
Attributed to:  Manufacturing of nano-engineered III-N semiconductors: Equipment Business Case funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1364/oe.431698

PubMed Identifier: 34615175

Publication URI: http://europepmc.org/abstract/MED/34615175

Type: Journal Article/Review

Volume: 29

Parent Publication: Optics express

Issue: 17

ISSN: 1094-4087