Negative Tone Metallic Organic Resists with Improved Sensitivity for Plasma Etching: Implications for Silicon Nanostructure Fabrication and Photomask Production. (2022)
Attributed to:
Manufacturing at the 7nm node and beyond enabled by novel resist technology
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1021/acsanm.2c02986
PubMed Identifier: 36583125
Publication URI: http://europepmc.org/abstract/MED/36583125
Type: Journal Article/Review
Volume: 5
Parent Publication: ACS applied nano materials
Issue: 12
ISSN: 2574-0970