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Confined high-pressure chemical deposition of hydrogenated amorphous silicon. (2012)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/ja2067862

PubMed Identifier: 22148467

Publication URI: http://europepmc.org/abstract/MED/22148467

Type: Journal Article/Review

Volume: 134

Parent Publication: Journal of the American Chemical Society

Issue: 1

ISSN: 0002-7863