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Spatially correlated erbium and Si nanocrystals in coimplanted SiO2 after a single high temperature anneal (2010)

First Author: Crowe I

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.3294645

Publication URI: http://dx.doi.org/10.1063/1.3294645

Type: Journal Article/Review

Parent Publication: Journal of Applied Physics

Issue: 4