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Geometry, Temperature, and Body Bias Dependence of Statistical Variability in 20-nm Bulk CMOS Technology: A Comprehensive Simulation Analysis (2013)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1109/ted.2013.2254490

Publication URI: http://dx.doi.org/10.1109/ted.2013.2254490

Type: Journal Article/Review

Parent Publication: IEEE Transactions on Electron Devices

Issue: 5