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Investigation of Strain-Relaxation Characteristics of Nitrides Grown on Si(110) by Metalorganic Chemical Vapor Deposition Using X-ray Diffraction (2013)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.7567/jjap.52.08jb24

Publication URI: http://dx.doi.org/10.7567/jjap.52.08jb24

Type: Journal Article/Review

Parent Publication: Japanese Journal of Applied Physics

Issue: 8S