The Study of Magnetized Electronegative Depositing Plasmas
Lead Research Organisation:
University of Liverpool
Department Name: Electrical Engineering and Electronics
Abstract
The importance of electronegative species in technological plasmas is currently of great interest, both from a theoretical and experimental point of view, with much of the recent work concentrating on reactive ion etching discharges.However, other very important plasma systems have been somewhat neglected by scientist and engineers in terms of the role of negative ions, for instance, pulsed magnetized discharges (the sputter magnetron) used for the reactive deposition of thin films which contain electronegative gases such as oxygen. In this project, we will perform the first detailed study of the role of negative ions on the structure and dynamics of the pulsed magnetron plasma. In particular, it is our aim to make quantitative temporal and spatial measurements of the concentrations, energies and fluxes of electronegative species such as O- and O2- in the magnetron. The experimental study will be supplemented by modelling activity necessary to fully understand and interpret our diagnostic tools and shed light on the fundamental physical processes. The plasma measurements will be useful in understanding thin film growth dynamics and the fundamental data can be used in other more surface engineering orientated projects.
People |
ORCID iD |
James Bradley (Principal Investigator) |
Publications
Bradley J
(2011)
Resonance hairpin and Langmuir probe-assisted laser photodetachment measurements of the negative ion density in a pulsed dc magnetron discharge
in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Bryant P
(2012)
Optimum circuit design for the detection of laser photodetachment signals
in Plasma Sources Science and Technology
Dodd R
(2009)
Negative Ion Density Measurements in Reactive Magnetron Sputtering Negative Ion Density Measurements in Reactive Magnetron Sputtering
in Plasma Processes and Polymers
Dodd R
(2010)
O- density measurements in the pulsed-DC reactive magnetron sputtering of titanium
in Thin Solid Films
Dodd R
(2010)
Negative ion density measurements in a reactive dc magnetron using the eclipse photodetachment method
in Plasma Sources Science and Technology
You S
(2010)
A study of the plasma electronegativity in an argon-oxygen pulsed-dc sputter magnetron
in Journal of Physics D: Applied Physics
Description | The first ever measurement of the O- denisty in reactive DC and pulsed DC O2 magnetron sputtering discharges. The O- density exceeds the eelctron denisty in off-time of the pulse. The o- density is upto 0.5 the eelctron denisty in DC mode. The energy flux of energetic target-born O- (from the cathode) at the substrate is > 10 the ion energy flux. |
Exploitation Route | Industrial development to alleviate negative ion damage in oxide film deposition processes |
Sectors | Aerospace, Defence and Marine,Chemicals,Construction,Electronics,Energy,Healthcare |
Description | Further non-funded research and trails in companies to elevate particle damage. |
First Year Of Impact | 2011 |
Sector | Aerospace, Defence and Marine,Electronics,Energy |
Impact Types | Societal |