Probabilistic Power-Fault Co-Optimisation (PFCO) for Cryogenic Logic Technologies
Lead Research Organisation:
LIVERPOOL JOHN MOORES UNIVERSITY
Abstract
High performance computing (HPC) and corresponding CMOS chips used in large data centres today face two major challenges:
(1) Energy: Achieving a low-energy, low-carbon, greener footprint is critical. It has been predicted that total energy consumed by data centres could increase 15 times by 2030, accounting for up to 8% of global electricity demand. It is crucial to develop new technologies that can drastically reduce HPC energy consumption by orders of magnitude.
(2) Performance: Due to the difficulties in continuing the conventional scaling, particularly for power reduction, HPC improvement has dramatically slowed from 32 times per decade in the 1990s to only 1.5 times per decade, as up to 80% of transistors on the chip cannot be used simultaneously due to chip overheating.
Power efficiency of logic technologies is limited by VDD, which cannot be scaled much below 0.8 V at room temperature, due to the large Vth and off-leakage imposed by the large sub-threshold swing (SS) of MOSFETs. Liquid nitrogen cooling can drastically improve the performance-to-energy ratio for greener data centres. The significantly reduced SS at cryogenic temperatures (CT) =77 K enables significant Vth and VDD scaling to ~0.1 V and 0.3 V, respectively, and delivers >7.5 times power reduction. DARPA recently called for ground-breaking innovations in cryogenic logic technologies and set the target of 25 times performance-to-power ratio (PPR) improvement.
However, nanoscale devices operating at a low VDD near Vth are susceptible to logic and timing faults from false transistor switching on/off, induced by charging and discharging of a single defect. The risk of false switching is amplified by the steeper I-V characteristic at CT. Existing device fault and reliability modelling cannot be used under low VDD at CT where the probabilistic process dominates, because they are based on conventional deterministic methodologies. These models use the accumulation or average of multiple defects to set the failure criteria. They are overly pessimistic and force the designers to use the worst-case methodology and unnecessarily large design margins, which hinders the achievement of the 25X Cryo-CMOS optimization targets. Therefore, a novel probabilistic criterion of Fault Rate in Per Million Operations (FPMO) should be used to identify the lowest VDD at CT, instead.
This project aims to break the bottleneck and fill in the knowledge gap of cryogenic power fault co-optimisation (PFCO) under ultra-low-VDD. SPICE-level compact modelling of probabilistic and quantum phenomena in defects and their correlations with random faults in devices and circuits will be developed, for achieving ultra-low power and ultra-low fault cryogenic HPC.
The project is built on the holistic integration of three key research pillars and objectives to demonstrate the probabilistic PFCO technology and EDA tools at defects, devices, circuits, and system modelling levels:
1) Measure and characterise different probabilistic defects/faults at CT.
2) Develop probabilistic physical and compact device/fault modelling.
3) Demonstrate the new probabilistic Power and Fault Co-optimisation strategy.
The integrated pursuit of the four WPs aims at delivering a major breakthrough deployable for HPC at low VDD and CT, through probabilistic fault modelling and Device-Technology-System co-optimisation for achieving unprecedented PPR, which is transformable for many other applications in low power design and green ICT technologies. The results will be implemented in cryogenic process-development-kits (PDK) and commercial design tools, and disseminated to leading industry and academia partners through collaborations with ARM, IBM, Synopsys, IMEC and Semiwise.
(1) Energy: Achieving a low-energy, low-carbon, greener footprint is critical. It has been predicted that total energy consumed by data centres could increase 15 times by 2030, accounting for up to 8% of global electricity demand. It is crucial to develop new technologies that can drastically reduce HPC energy consumption by orders of magnitude.
(2) Performance: Due to the difficulties in continuing the conventional scaling, particularly for power reduction, HPC improvement has dramatically slowed from 32 times per decade in the 1990s to only 1.5 times per decade, as up to 80% of transistors on the chip cannot be used simultaneously due to chip overheating.
Power efficiency of logic technologies is limited by VDD, which cannot be scaled much below 0.8 V at room temperature, due to the large Vth and off-leakage imposed by the large sub-threshold swing (SS) of MOSFETs. Liquid nitrogen cooling can drastically improve the performance-to-energy ratio for greener data centres. The significantly reduced SS at cryogenic temperatures (CT) =77 K enables significant Vth and VDD scaling to ~0.1 V and 0.3 V, respectively, and delivers >7.5 times power reduction. DARPA recently called for ground-breaking innovations in cryogenic logic technologies and set the target of 25 times performance-to-power ratio (PPR) improvement.
However, nanoscale devices operating at a low VDD near Vth are susceptible to logic and timing faults from false transistor switching on/off, induced by charging and discharging of a single defect. The risk of false switching is amplified by the steeper I-V characteristic at CT. Existing device fault and reliability modelling cannot be used under low VDD at CT where the probabilistic process dominates, because they are based on conventional deterministic methodologies. These models use the accumulation or average of multiple defects to set the failure criteria. They are overly pessimistic and force the designers to use the worst-case methodology and unnecessarily large design margins, which hinders the achievement of the 25X Cryo-CMOS optimization targets. Therefore, a novel probabilistic criterion of Fault Rate in Per Million Operations (FPMO) should be used to identify the lowest VDD at CT, instead.
This project aims to break the bottleneck and fill in the knowledge gap of cryogenic power fault co-optimisation (PFCO) under ultra-low-VDD. SPICE-level compact modelling of probabilistic and quantum phenomena in defects and their correlations with random faults in devices and circuits will be developed, for achieving ultra-low power and ultra-low fault cryogenic HPC.
The project is built on the holistic integration of three key research pillars and objectives to demonstrate the probabilistic PFCO technology and EDA tools at defects, devices, circuits, and system modelling levels:
1) Measure and characterise different probabilistic defects/faults at CT.
2) Develop probabilistic physical and compact device/fault modelling.
3) Demonstrate the new probabilistic Power and Fault Co-optimisation strategy.
The integrated pursuit of the four WPs aims at delivering a major breakthrough deployable for HPC at low VDD and CT, through probabilistic fault modelling and Device-Technology-System co-optimisation for achieving unprecedented PPR, which is transformable for many other applications in low power design and green ICT technologies. The results will be implemented in cryogenic process-development-kits (PDK) and commercial design tools, and disseminated to leading industry and academia partners through collaborations with ARM, IBM, Synopsys, IMEC and Semiwise.
Organisations
- LIVERPOOL JOHN MOORES UNIVERSITY (Lead Research Organisation)
- Interuniversity Micro-Electronics Centre (Collaboration)
- University of Glasgow (Collaboration)
- SemiWise Ltd. (Project Partner)
- Synopsys - Glasgow (Project Partner)
- IMEC (Project Partner)
- IBM Research GmbH (Project Partner)
- ARM LIMITED (Project Partner)
| Description | IMEC memory consortium, Belgium |
| Organisation | Interuniversity Micro-Electronics Centre |
| Department | Memory |
| Country | Belgium |
| Sector | Academic/University |
| PI Contribution | LJMU researchers and PhD students have been working with IMEC and participated in the weekly meeting with IMEC. The progress have been closely monitored. This provides a direct channel for collaboration between the present project team and IMEC consortium. Regular research meetings have been carried out online in which both parties discuss and contribute to the research. |
| Collaborator Contribution | IMEC Industrial Affiliation Program is a world-leading consortium including virtually all of the top semiconductor manufacturers among its core technology partners (eg Intel, Samsung, Micron Technology, Hynix, STMicroelectronics, NXP Semiconductors, and Toshiba, etc.) as well as most of the major capital equipment developers and manufacturers. Partners delegate senior industrial researchers to IMEC to carry out joint research using best in-class equipment within IMEC's 300mm clean room infrastructure to solve the most important issues commonly faced by the industry. The collaborative agreement officially signed by LJMU and IMEC takes the advantage of this program, which allows us to work closely with these partners throughout the project. This provides a unique and most effective path to disseminate the research results directly to the major industrial companies, and ensures the project to work at the front line of research and development of resistive switching devices. For example, 1) The project will be steered by researchers from the industrial consortium at IMEC to ensure its industrial relevance; 2) The 300k Euro worth of samples provided by IMEC are manufactured to the highest standard according to industrial partners' requirements in order to investigate issues of major concerns; 3) LJMU PhD students and researchers will be trained and participate in the weekly meeting at IMEC. The progress will be closely monitored. This will provide a direct channel for collaboration between the present project team and IMEC consortium; 4) The IP-irrelevant results can be disseminated directly to the core industrial partners through these meetings and feedbacks are received directly from the partners. In these meetings the potential applications of new theory and characterisation techniques are discussed and taken up by partners. 5) Senior managerial and technical members of partners participate the review week held twice every year at IMEC, during which the latest development will be presented and disseminated to the senior level, and will have direct impact on the research and development decision making. Four of the world top five semiconductor manufacturers, Intel (1st), Samsung (2nd), Micron (4th) and Hynix (5th), are members of the IMEC consortium and are working together on the resistive switching device programme. The fact that IMEC is willing to provide a wide range of support and become the project partner and industrial partners are willing to endorse the project and become the members of the steering panel demonstrate the importance of the issues addressed in this project to the global industry, and their recognition of the project team's ability to make major breakthrough. On this basis, it is clear that the project will have an international reach and will strengthen the link between UK and world leading companies. The results will provide important support to the modelling, manufacturing, quality assessment, and reliability sections of the industry, and provide the possibility to greatly enhance its technological and scientific impact. A new collaboration agreement between LJMU and IMEC is being signed till 2025, and has been renewed in 2025 for four more years. |
| Impact | A number of papers have been published in the flagship journal IEEE Transactions on Electron Devices and conferences IEEE Electron Device Meeting and IEEE VLSI Technology Symposium and the technique has been taken up by industrial partners at imec. Two research visits to imec has been carried out by LJMU researchers in 2019. A number of online project meeting have been held in 2020-2025. Regular meetings have been held in 2021-2025. A new collaboration agreement has been signed till 2025 and has been renewed for 4 more years. |
| Start Year | 2018 |
| Description | UK variability consortium |
| Organisation | Interuniversity Micro-Electronics Centre |
| Country | Belgium |
| Sector | Academic/University |
| PI Contribution | The team at LJMU has focused in the past 20 years and in seven EPSRC grants on developing new techniques for characterising defects in dielectric stacks, including HfO2 and Al2O3. A number of new techniques have been developed, such as the fast single pulse, multiple-pulse, on-the-fly techniques, etc. Systematic investigation has been carried out and new techniques have been developed for the resistive-switching RRAM and other memristive devices. A number of papers have been published in the flagship journal IEEE Transactions on Electron Devices and conferences IEEE Electron Device Meeting 2019 and IEEE VLSI Technology Symposium 2019, IEDM 2024 and IEDM2025. The techniques have been taken up by industrial partners at imec. New joint EPSRC grant applications have been submitted in 2022 and 2023 and 2025, and one has been awarded in Feb. 2025. |
| Collaborator Contribution | The partners have complementary strengths on the modelling, synthesis and characterisation of dielectric thin film: University of Glasgow on theory and simulation of defects in oxides and variability. A combination of modelling and simulation has been used at UoG to identify combinations of materials and the influence of their defect structures on key resistive switching variability parameters. These have been characterised using a range of physic-chemical-electrical analytical methods to correlate their microstructures with the modelling data and the electrical performance of resistive switching devices. IMEC has provided state-of-the-art RRAM and OTS devices to LJMU, and new techniques have been developed at LJMU, which have been taken up by industrial partner at IMEC, including Intel, Samsung and Micron. |
| Impact | A number of papers have been published in the flagship journal IEEE Transactions on Electron Devices and conferences IEEE Electron Device Meeting and IEEE VLSI Technology Symposium, and the techniques have been taken up by industrial partners at imec. Two posters and two presentations have been delivered at the IMEC technology review week to the industrial partners. Two visits to imec by LJMU researchers have been carried out in 2019. Multiple presentations have been given to the industrial partners at IMEC through Teams since Covid. A number of online project meetings between LJMU/imec and LJMU/Glasgow have been held since 2020. A new collaboration agreement between LJMU and IMEC has been signed till 2025, and has been renewed in 2025 till 2029. |
| Start Year | 2018 |
| Description | UK variability consortium |
| Organisation | University of Glasgow |
| Department | School of Engineering Glasgow |
| Country | United Kingdom |
| Sector | Academic/University |
| PI Contribution | The team at LJMU has focused in the past 20 years and in seven EPSRC grants on developing new techniques for characterising defects in dielectric stacks, including HfO2 and Al2O3. A number of new techniques have been developed, such as the fast single pulse, multiple-pulse, on-the-fly techniques, etc. Systematic investigation has been carried out and new techniques have been developed for the resistive-switching RRAM and other memristive devices. A number of papers have been published in the flagship journal IEEE Transactions on Electron Devices and conferences IEEE Electron Device Meeting 2019 and IEEE VLSI Technology Symposium 2019, IEDM 2024 and IEDM2025. The techniques have been taken up by industrial partners at imec. New joint EPSRC grant applications have been submitted in 2022 and 2023 and 2025, and one has been awarded in Feb. 2025. |
| Collaborator Contribution | The partners have complementary strengths on the modelling, synthesis and characterisation of dielectric thin film: University of Glasgow on theory and simulation of defects in oxides and variability. A combination of modelling and simulation has been used at UoG to identify combinations of materials and the influence of their defect structures on key resistive switching variability parameters. These have been characterised using a range of physic-chemical-electrical analytical methods to correlate their microstructures with the modelling data and the electrical performance of resistive switching devices. IMEC has provided state-of-the-art RRAM and OTS devices to LJMU, and new techniques have been developed at LJMU, which have been taken up by industrial partner at IMEC, including Intel, Samsung and Micron. |
| Impact | A number of papers have been published in the flagship journal IEEE Transactions on Electron Devices and conferences IEEE Electron Device Meeting and IEEE VLSI Technology Symposium, and the techniques have been taken up by industrial partners at imec. Two posters and two presentations have been delivered at the IMEC technology review week to the industrial partners. Two visits to imec by LJMU researchers have been carried out in 2019. Multiple presentations have been given to the industrial partners at IMEC through Teams since Covid. A number of online project meetings between LJMU/imec and LJMU/Glasgow have been held since 2020. A new collaboration agreement between LJMU and IMEC has been signed till 2025, and has been renewed in 2025 till 2029. |
| Start Year | 2018 |
