Material and device characterisation in the volume manufacture of VCSELs

The student will develop a simulation to predict the manufacturing performance and critical tolerances of epitaxial layer material including compositions, doping and layer thicknesses, using quantum mechanical and optical mode solvers, based on device performance and in-situ reactor characterisation and ex-situ characterisation of vertical cavity surface emitting lasers. The scientific challenges include optimising characterisation approaches and data handling as well as producing physical models to connect epitaxial structure and device function to maximise manufacturing tolerances and yield.

This project will be in collaboration with IQE, the global leader in the design and manufacture of advanced semiconductor wafer products.