Influence of F[sup +] Co-Implants on EOR Defect Formation in B[sup +]-Implanted, Ultrashallow Junctions (2007)

First Author: Boninelli S

Attributed to: University of Surrey Ion Beam Centre funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1149/1.2751837

Publication URI: http://dx.doi.org/10.1149/1.2751837

Type: Journal Article/Review

Parent Publication: Electrochemical and Solid-State Letters

Issue: 9