Enhanced n-type dopant solubility in tensile-strained Si (2008)

First Author: Bennett N

Attributed to: University of Surrey Ion Beam Centre funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.tsf.2008.08.072

Publication URI: http://dx.doi.org/10.1016/j.tsf.2008.08.072

Type: Journal Article/Review

Parent Publication: Thin Solid Films

Issue: 1