On artefacts in the secondary ion mass spectrometry profiling of high fluence H+ implants in GaAs (2010)

First Author: Bailey M
Attributed to:  University of Surrey Ion Beam Centre funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.nimb.2010.02.033

Publication URI: http://dx.doi.org/10.1016/j.nimb.2010.02.033

Type: Journal Article/Review

Parent Publication: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Issue: 11-12