Development of phase shift lithography for the production of metal-oxide-metal diodes (2014)
Attributed to:
High-resolution Electron Beam Lithography Critical Mass Grant
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1049/mnl.2014.0102
Publication URI: http://dx.doi.org/10.1049/mnl.2014.0102
Type: Journal Article/Review
Parent Publication: Micro & Nano Letters
Issue: 7