Electron channelling contrast imaging for III-nitride thin film structures (2016)
Attributed to:
Nanoscale characterisation of nitride semiconductor thin films using EBSD, ECCI, CL and EBIC.
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.mssp.2016.02.007
Publication URI: http://dx.doi.org/10.1016/j.mssp.2016.02.007
Type: Journal Article/Review
Parent Publication: Materials Science in Semiconductor Processing