Gettering of interstitial iron in silicon by plasma-enhanced chemical vapour deposited silicon nitride films (2016)

First Author: Liu A
Attributed to:  SuperSilicon PV: extending the limits of material performance funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.4967914

Publication URI: http://dx.doi.org/10.1063/1.4967914

Type: Journal Article/Review

Parent Publication: Journal of Applied Physics

Issue: 19