94FEC233-289A-4BCD-B91A-9BC9B87673B4Metrology concepts for a new generation of plasma manufacturing with atom-scale precisionResearch GrantEP/K018388/1798CB33D-C79E-4578-83F2-72606407192CEPSRCINCOME_ACTUAL19797759932E259-BBCB-44EE-90B0-01DCAB790655Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: excitation dynamics and ion flux asymmetryPlasma Sources Science and Technologyfbad55f107681557bd3c8e8f70bcaa7bBruneau B2016-01-01http://dx.doi.org/10.1088/0963-0252/25/4/045019http://dx.doi.org/10.1088/0963-0252/25/4/0450194Journal Article/Review585d589be986c7.34202313