Barrier tuning of atomic layer deposited Ta2O5 and Al2O3 in double dielectric diodes (2017)

First Author: Nemr Noureddine I

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1116/1.4974219

Publication URI: http://dx.doi.org/10.1116/1.4974219

Type: Journal Article/Review

Parent Publication: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Issue: 1