Electrical Characterization of Epitaxial Graphene Field-Effect Transistors with High-k Al<sub>2</sub>O<sub>3</sub> Gate Dielectric Fabricated on SiC Substrates (2015)
Attributed to:
Underpinning Power Electronics 2012: Devices Theme
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.4028/www.scientific.net/msf.821-823.937
Publication URI: http://dx.doi.org/10.4028/www.scientific.net/msf.821-823.937
Type: Journal Article/Review
Parent Publication: Materials Science Forum