Precursors for p-Type Nickel Oxide: Atmospheric-Pressure Metal-Organic Chemical-Vapour Deposition (MOCVD) of Nickel Oxide Thin Films with High Work Functions Precursors for p-Type Nickel Oxide: Atmospheric-Pressure Metal-Organic Chemical-Vapour Deposition (MOCVD) of Nickel Oxide Thin Films with High Work Fu (2017)

Abstract

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Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1002/ejic.201601419

Publication URI: http://dx.doi.org/10.1002/ejic.201601419

Type: Journal Article/Review

Parent Publication: European Journal of Inorganic Chemistry

Issue: 13