Plasma analysis of inductively coupled impulse sputtering of Cu, Ti and Ni (2017)
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1088/1361-6595/aa6f79
Publication URI: http://dx.doi.org/10.1088/1361-6595/aa6f79
Type: Journal Article/Review
Parent Publication: Plasma Sources Science and Technology
Issue: 6
ISSN: 0963-0252