Reconfigurable phase-change photomask for grayscale photolithography (2017)

First Author: Wang Q

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.4983198

Publication URI: http://dx.doi.org/10.1063/1.4983198

Type: Journal Article/Review

Parent Publication: Applied Physics Letters

Issue: 20

ISSN: 0003-6951