Demonstrating the Instability of SiC Ohmic Contacts and Drain Terminal Metallization Schemes Aged at 300 °C (2017)
Attributed to:
High Current Module and Technologies Optimised for HVDC
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.4028/www.scientific.net/msf.897.387
Publication URI: http://dx.doi.org/10.4028/www.scientific.net/msf.897.387
Type: Journal Article/Review
Parent Publication: Materials Science Forum
ISSN: 02555476