97B1C5DE-CA22-4319-BE35-6599AE111F17Manufacturing of nano-engineered III-nitride semiconductorsResearch GrantEP/M015181/1798CB33D-C79E-4578-83F2-72606407192CEPSRCINCOME_ACTUAL240189333A19E61-6573-4BF4-A604-E1B78BD615E3Understanding resolution limit of displacement Talbot lithographyOptics Express1f6907438a0c209eda5592c60df78cffChausse P2019-01-01http://dx.doi.org/10.1364/oe.27.00591830876189http://ukpmc.ac.uk/abstract/MED/308761891094-4087http://europepmc.org/abstract/MED/308761895Journal Article/Review5c87765104c2e0.67764474