Simulation of sputtering from an isolated conductor surrounded by a dielectric during plasma etching (2019)
Attributed to:
Parametric Wave Coupling and Non-Linear Mixing in Plasma
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.vacuum.2019.04.021
Publication URI: http://dx.doi.org/10.1016/j.vacuum.2019.04.021
Type: Journal Article/Review
Parent Publication: Vacuum