Atomic level termination for passivation and functionalisation of silicon surfaces. (2020)

First Author: Grant NE

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1039/D0NR03860A

PubMed Identifier: 32789341

Publication URI: http://europepmc.org/abstract/MED/32789341

Type: Journal Article/Review

Volume: 12

Parent Publication: Nanoscale

Issue: 33

ISSN: 2040-3364