Complementary Metal-Oxide-Semiconductor Compatible Deposition of Nanoscale Transition-Metal Nitride Thin Films for Plasmonic Applications. (2020)
Attributed to:
REACTIVE PLASMONICS: OPTICAL CONTROL OF ELECTRONIC PROCESSES AT INTERFACES FOR NANOSCALE PHYSICS, CHEMISTRY AND METROLOGY
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1021/acsami.0c10570
PubMed Identifier: 32960569
Publication URI: http://europepmc.org/abstract/MED/32960569
Type: Journal Article/Review
Volume: 12
Parent Publication: ACS applied materials & interfaces
Issue: 40
ISSN: 1944-8244