Electrodeposition of bismuth, tellurium and bismuth telluride through sub-10 nm mesoporous silica thin films (2024)

First Author: Shao L
Attributed to:  Correlative Raman, SEM and EDX for operando electrochemistry research funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.electacta.2024.144989

Publication URI: http://dx.doi.org/10.1016/j.electacta.2024.144989

Type: Journal Article/Review

Parent Publication: Electrochimica Acta

ISSN: 0013-4686