The role of inert gas in MW-enhanced plasmas for the deposition of nanocrystalline diamond thin films (2009)
Attributed to:
Molecular beam mass spectrometry of microwave activated plasmas used in diamond chemical vapour deposition
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.diamond.2009.01.004
Publication URI: http://dx.doi.org/10.1016/j.diamond.2009.01.004
Type: Journal Article/Review
Parent Publication: Diamond and Related Materials
Issue: 5-8