CFD optimisation of up-flow vertical HVPE reactor for GaN growth (2008)

First Author: Sytniewski L
Attributed to:  Growth of thick and flat high quality GaN using nano-column compliant layers funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.jcrysgro.2008.04.017

Publication URI: http://dx.doi.org/10.1016/j.jcrysgro.2008.04.017

Type: Journal Article/Review

Parent Publication: Journal of Crystal Growth

Issue: 14