Atomic layer deposition of TaN and Ta3N5 using pentakis(dimethylamino)tantalum and either ammonia or monomethylhydrazine (2011)

First Author: Fang Z
Attributed to:  Atomic layer deposition of Hafnium-nitride and Lanthanide nitrides funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.jcrysgro.2011.07.012

Publication URI: http://dx.doi.org/10.1016/j.jcrysgro.2011.07.012

Type: Journal Article/Review

Parent Publication: Journal of Crystal Growth

Issue: 1