Confined high-pressure chemical deposition of hydrogenated amorphous silicon. (2012)
Attributed to:
NSF Materials World Network: Creating Optoelectronic Materials and Devices Inside Microstructured Optical Fibers
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1021/ja2067862
PubMed Identifier: 22148467
Publication URI: http://europepmc.org/abstract/MED/22148467
Type: Journal Article/Review
Volume: 134
Parent Publication: Journal of the American Chemical Society
Issue: 1
ISSN: 0002-7863