Spatially correlated erbium and Si nanocrystals in coimplanted SiO2 after a single high temperature anneal (2010)
Attributed to:
Silicon emission technologies based on nanocrystals
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1063/1.3294645
Publication URI: http://dx.doi.org/10.1063/1.3294645
Type: Journal Article/Review
Parent Publication: Journal of Applied Physics
Issue: 4