Improved vertical MOSFET performance using an epitaxial channel and a stacked silicon-insulator structure (2012)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1088/0268-1242/27/6/062002

Publication URI: http://dx.doi.org/10.1088/0268-1242/27/6/062002

Type: Journal Article/Review

Parent Publication: Semiconductor Science and Technology

Issue: 6