The evolution of the plasma potential in a HiPIMS discharge and its relationship to deposition rate (2010)

First Author: Mishra A

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1088/0963-0252/19/4/045014

Publication URI: http://dx.doi.org/10.1088/0963-0252/19/4/045014

Type: Journal Article/Review

Parent Publication: Plasma Sources Science and Technology

Issue: 4